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Electronic grade hydrogen chloride is a high purity hydrogen chloride gas with a purity of more than 99.999%, mainly used in semiconductor, electronics, optoelectronics and other high-tech industries, can be used for the preparation of monocrystal silicon, optoelectronics, photovoltaic, flat panel display and other electronic industry fields, can also be used for silicon epitaxial growth, passivation and other aspects of integrated circuits.
Krypton gas is a gas with a molecular weight of 83.80, which has a very high melting point, boiling point, critical temperature and critical pressure, and is widely used in the electronics industry, electric light source industry, gas laser ion flow and mining lamp manufacturing. In addition, krypton gas has many applications in the aerospace field, such as as a propellant, a communication medium for space communications, and a medium for animal experiments in space biology.
Lithographic gas is the gas used by lithographic printing press to produce deep ultraviolet laser, lithographic gas is mostly a mixture, can be customized for customers, can be used to manufacture microelectronic devices and integrated circuits, medical devices, drug carriers and biosensors, in the field of optical communication can be used to manufacture optical components such as fiber, grating and wave plate.
Neon gas is a rare gas with a melting point of 24.55K, a boiling point of 101.325kPa, a critical temperature of 44.4K, a critical pressure of 2.65MPa, and a critical volume of 41.7cm ³/mol. It can be used in neon lights, mercury lamps, insulated detectors, high-frequency electron microscopy, plasma research, laser, etc., and can also be used in industrial and scientific fields. It can also be used in fields such as laser technology and cryogenic coolants.
Nitrogen trifluoride is used to clean chemical vapor deposition units, can be used alone or combined with other gases as plasma etching gas and reaction chamber cleaner, suitable for semiconductor chips, flat screen, glass fiber, photovoltaic cells and other manufacturing fields, with excellent etching rate and selectivity, than other etching gases have higher etching rate and selectivity of silicon and silicon nitride. It has a wide application prospect in the electronic industry.
Name: Nitrous oxide
Alias: laughing gas
Purity: 99.9995%
Packing: 47L/470L
Chemical formula: N₂O
CAS login number: 10024-97-2
Molecular weight: 44.013
