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Titanium tetrachloride is an inorganic compound with the chemical formula TiCl4, mainly used for the production of sponge titanium and titanium dioxide powder, and can also be used as a catalyst.
Trimethylantimony, with the molecular formula Sb (CH3) 3, is a colorless and transparent liquid with a garlic odor. It is mainly used in metal organic chemical vapor deposition (MOCVD) processes and organic synthesis in the electronic industry.
Trimethylsilylamine (chemical formula N(SiH3)3, referred to as TSA), is a colorless, easily hydrolyzed liquid with good fluidity. It has a melting point of -105.6 ° C and a boiling point of +52 ° C.
Trisilane is a chemical substance with a molecular structure consisting of three silicon atoms and a chemical formula of Si3H8. At room temperature and pressure, propylsilane appears as a colorless and easily self igniting liquid. It was discovered by Carol Bosky and Alfred Stoke in 1916. It is worth noting that since Trilane does not contain carbon, it is not an organic compound.
Its main uses are semiconductor silicon film manufacturing and amorphous silicon manufacturing.
Diiodosilane, as a silicon-based precursor material, can rapidly form a uniform and dense silicon nitride (n-Si) film layer in the atomic layer deposition process within a lower temperature window region. This deposited n-Si film layer can meet the requirements of integrated circuit chip manufacturing processes, so diiodiosilane is widely used in the field of advanced semiconductor chip manufacturing.
Pentakis(dimethylamino)tantalum (PDMAT) is most widely used as a tantalum source for TaN barrier layers to prevent copper diffusion into silicon in multilevel metallizationsemiconductor devices Despite the presence of N in the molecule, it is beneficial to use an additional nitrogen source (i.e. NH3) to obtain high quality films.
PDMAT may also be used to deposit Ta2O5 for dielectric applications in similar devices to achieve these films, an oxidising source is used (i.e. H2O/O2). PDMAT reacts vigorously with such sources hence strict inert atmosphere conditions are recommended to avoid degradation and/or premature reaction.
