Anhui Argosun Electronic New Materials Co., Ltd

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Lithographic gas is the gas used by lithographic printing press to produce deep ultraviolet laser, lithographic gas is mostly a mixture, can be customized for customers, can be used to manufacture microelectronic devices and integrated circuits, medical devices, drug carriers and biosensors, in the field of optical communication can be used to manufacture optical components such as fiber, grating and wave plate.
Neon gas is a rare gas with a melting point of 24.55K, a boiling point of 101.325kPa, a critical temperature of 44.4K, a critical pressure of 2.65MPa, and a critical volume of 41.7cm ³/mol. It can be used in neon lights, mercury lamps, insulated detectors, high-frequency electron microscopy, plasma research, laser, etc., and can also be used in industrial and scientific fields. It can also be used in fields such as laser technology and cryogenic coolants.
Nitrogen trifluoride is used to clean chemical vapor deposition units, can be used alone or combined with other gases as plasma etching gas and reaction chamber cleaner, suitable for semiconductor chips, flat screen, glass fiber, photovoltaic cells and other manufacturing fields, with excellent etching rate and selectivity, than other etching gases have higher etching rate and selectivity of silicon and silicon nitride. It has a wide application prospect in the electronic industry.
Name: Nitrous oxide
Alias: laughing gas
Purity: 99.9995%
Packing: 47L/470L
Chemical formula: N₂O
CAS login number: 10024-97-2
Molecular weight: 44.013
Octa-fluorocyclobutane is a special gas with excellent thermal conductivity and heat capacity, which is widely used in electronics, chemical industry, aerospace, refrigeration and other fields. It can be used in refrigerants and air conditioners, fire extinguishing agents, cleaning agents, etc., and can also be used in the production of fluoropolymer compounds and fluorine-containing fine chemicals
Octafluoropropane is a colorless gas with the chemical formula c3f8, used for filling vitreous cavities after vitreous cutting, as well as for high pressure insulation, refrigerant, plasma dry etching. It is a strong oxidizing agent that can be used to produce compounds such as nitrogen trifluoride and boron trifluoride, and has many application scenarios in the industrial field.
Silicon tetrachloride is a colorless transparent heavy liquid, which can be used to manufacture silicate, silicone monomer, silicone oil, high temperature insulation materials, silicone resin, silicone rubber, etc., and can also be used as smoke screen agent. Electronic grade silicon tetrachloride is a high-end electronic chemical that can be used in thin film deposition and etching processes, and can also be used in the production of ethyl orthosilicate, the main feedstock for aerogel.
Trichlorosilane is a colorless liquid, volatile and delirious, mainly used in the production of polysilicon, photovoltaic, semiconductor and ceramics and other industries, is also the most basic monomer of organosilane coupling agent, plays an important role in various fields, with acute toxicity and flammable and explosive.
Tungsten hexafluoride is an inorganic compound with colorless gas properties and soluble in organic solvents. It is mainly used in the field of integrated circuit manufacturing and chemical vapor deposition process, and can also be used as a raw material for fluorinating agents, polymerization catalysts and optical materials. In addition, it can also be used to manufacture low resistance, high melting point interconnect and tungsten tubes, calipers and other certain tungsten components.
Xenon (Xe) Molecular weight: 131.29
Melting point: -111.79℃
Boiling point: -108.12℃
Critical temperature: 16.59℃
Critical pressure: 5.84MPa
Critical volume: 118cm³/mol

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