Nitrogen trifluoride is used to clean chemical vapor deposition units, can be used alone or combined with other gases as plasma etching gas and reaction chamber cleaner, suitable for semiconductor chips, flat screen, glass fiber, photovoltaic cells and other manufacturing fields, with excellent etching rate and selectivity, than other etching gases have higher etching rate and selectivity of silicon and silicon nitride. It has a wide application prospect in the electronic industry.
